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Responsivity, Rise Time for Bi2O3 /Si Photo Detector | ||
| Engineering and Technology Journal | ||
| Article 1, Volume 32, 1B, 2014, Pages 33-38 PDF (370.81 K) | ||
| DOI: 10.30684/etj.32.1B.5 | ||
| Authors | ||
| Evan Tariq Al Waisy; Marwa S. Al Wazny | ||
| Abstract | ||
| In the present work, three different active layer thicknesses of Bi2O3 filmswas employ for fabricated n-Bi2O3/p-Si heterojunction detector, using reactive pulse laser deposition technique as preparation method, detector parameter was carried out,responsivity, detectivity quantum efficiency and rise time in order to investigated the performance of the fabricated devise | ||
| Keywords | ||
| Reactive Pulse Laser Deposition; Bismuth Oxide; Heterojunction; responsivity; Rise Time; Active Layer Thicknesses | ||
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