- All Journals
- Al-Qadisiyah University
- Basrah University
- Kirkuk University
- Mosul University
- The Iraqi Borad for Medical Specialization
- University of Anbar
- University of Technology
- Al Mustafa University
- Al-Zahraa University for Women
- Alnoor University
- Kunooz University
- Misan University
- Ninevah University
- Tikrit University
- University of Al-Hamdaniya
- University of Kerbala
Control the deposition uniformity using ring cathode by DC dischargetechnique | ||
| Iraqi Journal of Physics | ||
| Article 1, Volume 15, Issue 32, 2017, Pages 57-67 | ||
| Authors | ||
| Kadhim A. Aadim; Muhammad O. Salman | ||
| Abstract | ||
| Simulation ofdirect current (DC) discharge plasma using COMSOL Multiphysicssoftware were used to study the uniformity of deposition on anode from DC discharge sputteringusing ring and disc cathodes, then applied it experimentally to make comparison between film thickness distribution with simulation results. Both simulation and experimental results shows that the deposition using copper ring cathode is more uniformity than disc cathode. | ||
| Keywords | ||
| Simulation; DC discharge; Sputtering | ||
|
Statistics Article View: 179 PDF Download: 44 |
||