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Effect of sputtering power on optical Properties of RF sputtering deposited Ti6Al4V Thin Films | ||
| Iraqi Journal of Physics | ||
| Article 1, Volume 15, Issue 33, 2017, Pages 71-77 | ||
| Authors | ||
| Mohammed K. Khalaf; Dawood Salman Ali | ||
| Abstract | ||
| Ti6Al4V thin film was prepared on glass substrate by RF sputtering method. The effect of RF power on the optical properties of the thin films has been investigated using UV-visible Spectrophotometer. It's found that the absorbance and the extinction coefficient (k) for deposited thin films increase with increasing applied power, while another parameters such as dielectric constant and refractive index decrease with increasing RF power. | ||
| Keywords | ||
| Thin films; RF sputtering; Optical Properties | ||
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