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THE ELECTROCHROMIC PROPERTY OF WO3 THIN FILM PREPARING BY MAGNETRON SPUTTERING UNDER VARIOUS CRYSTAL STRUCTURES | ||
| KUFA JOURNAL OF ENGINEERING | ||
| Article 1, Volume 8, Issue 3, 2017, Pages 46-54 | ||
| Author | ||
| Haider A. Shukur | ||
| Abstract | ||
| Tungsten Trioxide (WO3) thin films with a various crystal structure have been fabricated by a magnetron sputtering method. The effect of changing of crystal structure on the Electrochromic (EC) property was investigated. Atomic force microscopy (AFM) and X-ray diffraction (XRD) have been employed to investigate morphology and structure. For EC measurement, 0.1M LiClO4 aqueous solution was used as electrolyte, and Pt and Ag/AgCl were used for counter and reference electrodes respectively. WO3 thin film with a various structure has been obtained by changing reactive gas (Ar) gas and O2 flow rates. Fabricated WO3 thin films with 002 and 112 crystal structures have a high Electrochromic (EC) response. | ||
| Keywords | ||
| Thin films; Electrochromic characteristics; Sputtering Deposition | ||
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