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Aluminum Concentration Drives the Structural Evolution of Magnetron Sputtering (Ti, Al) C Thin Film | ||
| Engineering and Technology Journal | ||
| Article 1, Volume 36, 1A, 2018, Pages 70-74 PDF (356.08 K) | ||
| DOI: 10.30684/etj.2018.136777 | ||
| Author | ||
| A. Al-Ghaban | ||
| Materials Engineering Department, University of Technology, Baghdad, Iraq | ||
| Abstract | ||
| The effect of deposited Al on the structural evolution of TiC films with a chemical composition variation has investigated during combinatorial magnetron sputtering of binary ceramic (Ti, Al) C. The here produced thin films have been investigated by energy dispersive X-ray spectroscopy (EDX) and X-ray diffraction technique XRD. The structural evolution of combinatorial magnetron sputtered Ti-Al-C system deposited at room temperature fined to be located in the extent of: Ti at.%= 36.74-60.55, Al at.%= 12.05-30.61 and C at.%= 22.53-47.69. XRD results show that films are constituted of mostly cubic (Ti, Al) C phase as well as an X-ray amorphous region in the range of Ti at. %= 37.31-54, Al at. %= 27.67-30.61 and C at. %= 22.53-36.92. A clear evidence for the formation of two different structural regions driving by Al concentration has been observed. X ray analysis also shows that the (111) orientation in the (Ti, Al) C phase is dominant with increasing the Ti concentration. | ||
| Keywords | ||
| Aluminium; Magnetron Sputtering; TiCx; Structural Evolution | ||
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