- All Journals
- Al-Qadisiyah University
- Basrah University
- Kirkuk University
- Mosul University
- The Iraqi Borad for Medical Specialization
- University of Anbar
- University of Technology
- Al Mustafa University
- Al-Zahraa University for Women
- Alnoor University
- Kunooz University
- Misan University
- Ninevah University
- Tikrit University
- University of Al-Hamdaniya
- University of Kerbala
Study The Surface Characterization of Anodic grow SiO2 nano Film on Si by using AFM | ||
| College Of Basic Education Research Journal | ||
| Article 19, Volume 14, Issue 4, 2018, Pages 511-532 PDF (0 K) | ||
| DOI: 10.33899/berj.2018.159205 | ||
| Author | ||
| Assim A. Issa | ||
| Abstract | ||
| In this work studied The surface characterization of SiO2 nano film in the thickness range (2.3- 11.5) nm by using atomic force microscopy . SiO2 nano film growth on Silicon (100) p-type substrates , by using the anodic oxidation technique using (%75H2O+%25 isopropanol ) solution containing 0.1N KNO3 as supporting electrolyte. The chemical analysis of the surface of SiO2 has been done by (EDAX) shows the presence of O and Si elements, The films thickness has been found that is increases as formation potential increases. The (AFM) is used to study the nanotopography of SiO2 film . However it has been found that all of the following characteristics ,the nanotopography of the SiO2 nano film , root mean square RMS surface roughness of the SiO2 nano film , grain area , grain volume and grain length increases with the increase of SiO2 nano thickness. . | ||
| Keywords | ||
| AFM; SiO; nanotopography of SiO | ||
|
Statistics Article View: 323 PDF Download: 166 |
||