The Structural and Optical Investigation of Grown GaN Film on Porous Silicon Substrate Prepared by PLD

Jabar, Haneen D.; Fakhri, Makram A.; AbdulRazzaq, Mohammed J.; Gopinath, Subash C. B.

doi:10.30684/etj.2022.135733.1281

	The Structural and Optical Investigation of Grown GaN Film on Porous Silicon Substrate Prepared by PLD
Engineering and Technology Journal
Article 1, Volume 41, Issue 2, 2023, Pages 270-279 PDF (1.41 M)
Document Type: Research Paper
DOI: 10.30684/etj.2022.135733.1281
Authors
Haneen D. Jabar¹; Makram A. Fakhri^* ²; Mohammed J. AbdulRazzaq³; Subash C. B. Gopinath⁴
¹Laser and Optoelectronics Engineering Department, University of Technology-Iraq, Baghdad, Iraq
²Laser and Optoelectronics Engineering Department- University of Technology-Iraq-Baghdad
³Laser and Optoelectronic engineering, University of technology-Iraq, Baghdad, Iraq.
⁴Institute of Nano Electronic Engineering, Universiti Malaysia Perlis, Malaysia
Abstract
The optical properties of a grown gallium nitride (GaN) thin film on a porous silicon (P-Si) substrate was investigated. A Photo-electrochemical etching method was used to synthesize the Psi substrate, and a physical deposition method (pulsed laser deposition) of 1064 nm Q-switch Nd: YAG laser with a vacuum of 10⁻² mbar was used to grow a thin layer of GaN on a prepared P-Si substrate. X-Ray diffraction displayed that GaN film has a high crystalline nature at the (002) plane. The photoluminescence of GaN film exhibited ultraviolet PL with a peak wavelength of 374 nm corresponding to GaN material and red PL with a peak wavelength of 730 nm corresponding to Psi substrate. The absorption coefficient of the P-Si substrate and grown GaN thin film was obtained from the absorption calculation of UV-Vis diffused spectroscopy at ambient temperature in the 230–1100 nm wavelength range. Extinction coefficients, optical energy gap, and refractive index of both the P-Si substrate and the grown GaN thin film have been determined, respectively. The direct optical energy gaps of both the P-Si substrate and grown GaN have also been determined using three methods: Plank’s relation with photoluminescence (PL) spectroscopy, Tauc'relation, and Kubulka-Munk argument with Uv-Vis diffused spectroscopy. It was observed that the optical energy gap of the P-Si substrate was 2.1 eV, while the grown GaN thin film had a multi-optical energy gap of 3.3 eV and 1.6 eV. A good agreement has been obtained between these mentioned methods.
Highlights
Grown GAN thin film had a hexagonal crystalline structure and high-intensity peak at the (002) plane. The absorption spectrum of grown GaN film showed a high absorbance at a UV spectrum of 302.88, 435.26 nm. Three methods relations were used to estimate the optical energy gap of prepared P-Si substrate and grown GaN film. The optical energy gap of the P-Si substrate was 2.1 eV, while the grown GaN thin film had a multi-optical energy gap of 3.3 and 1.6 eV.
Keywords
GaN; P-Si; Etching; Pulsed Laser deposition Optical Properties

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