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Optical Method to Determine the Orientation of Monocrystalline Silicon Wafers | ||
| Engineering and Technology Journal | ||
| Article 1, Volume 25, Issue 8, 2007, Pages 950-954 PDF (187.28 K) | ||
| DOI: 10.30684/etj.25.8.3 | ||
| Authors | ||
| Saria D. Al-Alagawi; Manal A. Aboud | ||
| Abstract | ||
| In this work, an optical method was used for the determination of the crystalline orientation of the chemically etched silicon surfaces in the (111), (110) and (100) planes. This method depends on the light patterns of laser beam reflected from the monocrystalline surfaces. The optical method submits acceptable measuring accuracy and well-distinguished folded patterns. | ||
| Keywords | ||
| Crystalline orientation; Crystallographic orientation; Optical reflectogram technique | ||
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