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Effect of Substrate Temperature on the Structural and Morphological Properties of Nano-structure ZnO films by Pulsed Laser Deposition | ||
| Engineering and Technology Journal | ||
| Article 1, Volume 29, Issue 1, 2011, Pages 58-64 PDF (1.58 M) | ||
| DOI: 10.30684/etj.29.1.5 | ||
| Authors | ||
| Adawiya J. Haider; Afnan k. yousif | ||
| Abstract | ||
| In this work, ZnO thin films were grown on sapphire (0001) substrate by Pulsed Laser Deposition using SHG with Q-switched Nd:YAG pulsed laser operation at 532nm in O2 gas ambient 5×10-2 mbar at different substrate temperatures varying from room temperature to 500°C. The influence of the substrate temperature on the structural and morphological properties of the films were investigated using XRD and SEM. As result, at substrate 400°C, a good quality and crystalline films were deposited that exhibits an average grain size (XRD) of 22.42nm with an average grain size (SEM) of 21.31nm. | ||
| Keywords | ||
| PLD; ZnO films; Substrate temperature; Crystal quality; grain size; Optical properties; Nanostructures; YAG Q; Switching | ||
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