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Anisotropic etching of poly-silicon wafer by using CF3Br plasma | ||
| Diyala Journal For Pure Science | ||
| Article 1, Volume 6, Issue 1, 2010, Pages 368-374 | ||
| Author | ||
| Intessar K.Abd | ||
| Abstract | ||
| These papers study the operation of etching poly-silicon wafer by using CF3Br plasma under condition 40mT, 1500 volt. Obtained on directional etching (anisotropic etching) with less selectivity, the directional etching caused lattice damages on the surface of the wafer. | ||
| Keywords | ||
| Anisotropic etching of poly; silicon wafer by using CF; poly; silicon | ||
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