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Synthesis, Characterization and Photocrosslinking of Negative Photoresist Polymers | ||
| Iraqi National Journal Of Chemistry | ||
| Article 1, Volume 0, Issue 32, 2014, Pages 648-665 | ||
| Authors | ||
| Nadhir. N.A.Jafar; Mousa Al-Smadi | ||
| Abstract | ||
| Abstract In this study, a new polymers (8) and (13) that contain 1,2,3-Thiadiazole or 1,2,3-Selenadiazole heterocyclic rings in the side chains from the reaction of the commercial available Polymer (Poly[4-hydroxystyrene]) with substituted 1,2,3-Thiadiazole or 1,2,3-Selenadiazole were prepared. The 1,2,3-Thiadiazole and 1,2,3-Selenadiazole heterocyclic rings in the side chains of the polymers are able to undergo cycloaddition reaction with evolution of nitrogen, when treated with UV- light either in solution or as thin films. These reactions were followed up by using spectroscopic techniques like (UV-Visible and Infrared) spectroscopy. The decrease of the absorption peaks in the UV-spectra and the emission peaks in the IR-spectra that are characteristic of the 1,2,3-Thiadiazoles and of the 1,2,3-Selenadiazoles is followed. The crosslinking reactions of the polymers were carried out in solution and as a thin film through irradiation with UV-lamp λmax=294 light source (150 watt). These compounds showed an importance in microlithography, manufacturing of electronic devices and in pharmacological uses as antibacterial and fungus because they contain 1,2,3-Thiadiazole and 1,2,3-Selenadiazole heterocyclic rings. | ||
| Keywords | ||
| thiadiazole; polymer; Photoresist; Negative; Photocrosslinking | ||
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