- All Journals
- Al-Qadisiyah University
- Basrah University
- Kirkuk University
- Mosul University
- The Iraqi Borad for Medical Specialization
- University of Anbar
- University of Technology
- Al Mustafa University
- Al-Zahraa University for Women
- Alnoor University
- Kunooz University
- Misan University
- Ninevah University
- Tikrit University
- University of Al-Hamdaniya
- University of Kerbala
Studying Properties of SF6 Plasma | ||
| Journal of Research Diyala humanity | ||
| Article 1, Volume 0, Issue 37, 2017, Pages 61-72 | ||
| Author | ||
| Intessar K. Abd | ||
| Abstract | ||
| SF6 plasma properties has studied SF6 gas was used as an etching gas . A home built lab. Scale plasma etching system was employed to generate DC plasma. A current density as a function of etch rate vs. voltage at constant pressure and current density as a function of etch rate vs. pressure at constant voltage without wafer were obtained the topography of etchant Silicon - wafer i.e., anisotropy under cutting and dimension were tested .The results were : increasing the voltage and pressure led to increase the current density . | ||
| Keywords | ||
| gas SF | ||
|
Statistics Article View: 169 PDF Download: 82 |
||