(2011). Design and preparation of an anti-reflective system when the extent of wavelengths (1.5 -0.8) µm with transmission of greater than 90%.. , 3(1), 20-25.
. "Design and preparation of an anti-reflective system when the extent of wavelengths (1.5 -0.8) µm with transmission of greater than 90%.". , 3, 1, 2011, 20-25.
(2011). 'Design and preparation of an anti-reflective system when the extent of wavelengths (1.5 -0.8) µm with transmission of greater than 90%.', , 3(1), pp. 20-25.
Design and preparation of an anti-reflective system when the extent of wavelengths (1.5 -0.8) µm with transmission of greater than 90%.. , 2011; 3(1): 20-25.

Design and preparation of an anti-reflective system when the extent of wavelengths (1.5 -0.8) µm with transmission of greater than 90%.

Journal of Kufa - physics
Article 1, Volume 3, Issue 1, 2011, Pages 20-25
Abstract
Was prepared in a multi-layered anti-reflection coating on the substrate of the type ((Borosilicate crown glass (BK-7), and by using two layers, the first layer (TiO2) with optical thickness of about (0.415 nm.) And the second layer (SiO2) with optical thickness of about (1.26 nm .), and using an ion source type Cofman with diameter (3 cm) and ions energy ranging
(150-300 eV) for the purpose of obtaining stable films, the results showed that the transmittance of this system has increased when the wavelength (1060 nm.) To the value of 90.7%.
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