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Study of sputtering parameter in D.C. planar magnetron sputtering | ||
| journal of kerbala university | ||
| Article 1, Volume 4, Issue 2, 2008, Pages 286-293 PDF (0 K) | ||
| Authors | ||
| Majid. H. Dwech; Sarmed. S. AL-Awadi; Qusay A. Abbes; Fadhil Yousif Hadi | ||
| Abstract | ||
| In this research used the D.C. planar magnetron sputtering and measurement the some parameter to magnetron sputtering to effect to deposition thin film; this parameters were the pressure, voltage the glow discharge, distance between the target and the substrate, and thickness for thin film. We found the best conditions in the pressure (300mtorr) and distance (4cm) to good thin film. | ||
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