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Preparation of Double - Layer Anti Reflection Coating (ARCs) in the Infrared Region | ||
| Journal of College of Education | ||
| Article 1, Volume 0, Issue 6, 2017, Pages 43-51 | ||
| Authors | ||
| ; ; ; | ||
| Abstract | ||
| Thennal evaporation method rvas employecl to cleposit magnesiunr f-luoride MgF2_and Zinc Sulfrde (ZnS) as a double layer in the range ( 1.4- 5) ptm. MgF2 was deposited as inner layer ri'ith film thickness of 525.3 nnr and deposition rate of I nnVs while ZnS u,as depositecl as the outer layer rvitlr film thickness 295.3 nm and deposition rate of 0.9nn/s on both sides of i,rtrinsic and extrinsic Si substrate and proved that the rnaximurr transnrittance at 2.9pm increases fi'om Soy'o to 87% fbr irrtrinsic Si srtbstrate, while increases to (68o/o,62Yo,569/o) for extrinsic Si t1,pe rvit[ thickness (0. 5,1,1.5)rtrn-r respectively . Thc toleration of the prepared f-ilnrs was stlrdied using Nc1 - glass laser. systenr outpttt ener-qy l0 .l , PLrlse duration about 300prs by gsing difltrent tests .ln the first test, difTbrent energy densiq' fbr a single slrot 'rvas usecl to clctet'ttiine the darnage tlrreshold whicli rvas about 28.3 Jlcnt, fbr the cloublc Iaycr filnr. In the sccortd tesl ive used the sallc cnel'gy (less than the datrage threshold) but with different number of shots until the daptage threshold was reaclted. The time irrterval betri een shots rvas aboLrt 5 Sec. | ||
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