M. Al-Mukh and S.I. Easa, J., H. Saeed, F. (2006). Model Calculation for Ion Implantation. , 24(1), 109-118.
J. M. Al-Mukh and S.I. Easa; F. H. Saeed. "Model Calculation for Ion Implantation". , 24, 1, 2006, 109-118.
M. Al-Mukh and S.I. Easa, J., H. Saeed, F. (2006). 'Model Calculation for Ion Implantation', , 24(1), pp. 109-118.
M. Al-Mukh and S.I. Easa, J., H. Saeed, F. Model Calculation for Ion Implantation. , 2006; 24(1): 109-118.

Model Calculation for Ion Implantation

basrah journal of science
Article 1, Volume 24, Issue 1, 2006, Pages 109-118    PDF (0 K)
Authors
J. M. Al-Mukh and S.I. Easa; F. H. Saeed
Abstract
In this paper, the diffusion of gas atoms that injected by ion implantation into
a layer of certain thickness is studied and investigated by using the equation for the
local gas atom concentration. The ion implantation in to multilayer membrane will be
investigated and parameterized, with various situations will be discussed.
Notablly, we assume that the implanted ion flux up on the surface dose not sputter the
target atomes or in other words the coefficient of sputtering is small which means that
the incident ions are light
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