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The Electronic Excitations of the Desorbed Species Throughout Sputtering Process | ||
| Journal of Basrah Researches (Sciences) | ||
| Article 1, Volume 36, Issue 1, 2010, Pages 1-18 PDF (0 K) | ||
| Authors | ||
| H. B. Salman and J. M. Al-Mukh; A. R. Ahmed | ||
| Abstract | ||
| In the present work , theoretical study is presented to calculate the neutralization probability throughout the ground state channel and the neutralization probability throughout the excited state channel for the desorbed particle throughout the sputtering process . The Hamiltonian that describes the system is written taking into account the ground and the excited states of the sputtered particle. We get use of Heisenberg equations of motion to derive the equations of motion that describe the system . To simplify the solution of the equations , wide band approximation is used then the law of charge conservation is investigated . The equations are solved numerically and the sputtered atom – surface interaction is investigated along its classical trajectory as it goes far away from the surface . Extended model parameterization is presented to check the general features of sputtered atom – surface interaction and the concept of interference energy is discussed . Our treatment is applied to real system , that is the sputtering of atom from polycrystalline silver surface . The neutralization probabilities throughout ground state and the excited state channels are calculated as a function of time , the normal velocity component of the sputtered atom and for different values of the strength of interaction that related to the electronic structure of sputtering region . The results we get show qualitative agreement with the experimental data and with results of the de – excitation model . These results are emploied to calculate the photon yield as a function of the sputtering atom’s normal velocity component and for different values of interaction strength . | ||
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