Mousa, A., Nasher, S., Ponpon, J. (2008). Influence of Deposition Parameters on Optical and Electrical Properties of CuxS Thin Films Prepared Using Chemical Bath Deposition Method. , 4(3), 19-24.
A.M. Mousa; S.H. Nasher; J.-P. Ponpon. "Influence of Deposition Parameters on Optical and Electrical Properties of CuxS Thin Films Prepared Using Chemical Bath Deposition Method". , 4, 3, 2008, 19-24.
Mousa, A., Nasher, S., Ponpon, J. (2008). 'Influence of Deposition Parameters on Optical and Electrical Properties of CuxS Thin Films Prepared Using Chemical Bath Deposition Method', , 4(3), pp. 19-24.
Mousa, A., Nasher, S., Ponpon, J. Influence of Deposition Parameters on Optical and Electrical Properties of CuxS Thin Films Prepared Using Chemical Bath Deposition Method. , 2008; 4(3): 19-24.

Influence of Deposition Parameters on Optical and Electrical Properties of CuxS Thin Films Prepared Using Chemical Bath Deposition Method

Iraqi Journal of Applied Physics
Article 1, Volume 4, Issue 3, 2008, Pages 19-24
Authors
A.M. Mousa; S.H. Nasher; J.-P. Ponpon
Abstract
Thin films of CuxS have been deposited in an aqueous solution of copper chloride, tri ethanol amine, aqueous ammonia and thiourea. The effect of deposition time, solution pH and thiourea amount on films thickness, growth rate, optical and electrical properties has been studied. The film thickness increases with increasing deposition time and thiourea volume, whereas it decreases with increasing the solution pH. The corresponding small modifications of optical properties can be explained by the increase in roughness with film thickness. Electrical resistivity is strongly influenced by the solution pH and by the thiourea amount but depends to a much less extent on the film thickness.
Keywords
CuxS; Chemical bath deposition; Optical properties; electrical properties
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