A.I, R., A.A, O. (2013). Characterization of Indium Oxide Thin Films Grown on Silicon Substrates by Spray Pyrolysis Technique. , 9(2), 11-14.
Raid A.I; Omar A.A. "Characterization of Indium Oxide Thin Films Grown on Silicon Substrates by Spray Pyrolysis Technique". , 9, 2, 2013, 11-14.
A.I, R., A.A, O. (2013). 'Characterization of Indium Oxide Thin Films Grown on Silicon Substrates by Spray Pyrolysis Technique', , 9(2), pp. 11-14.
A.I, R., A.A, O. Characterization of Indium Oxide Thin Films Grown on Silicon Substrates by Spray Pyrolysis Technique. , 2013; 9(2): 11-14.

Characterization of Indium Oxide Thin Films Grown on Silicon Substrates by Spray Pyrolysis Technique

Iraqi Journal of Applied Physics
Article 1, Volume 9, Issue 2, 2013, Pages 11-14
Authors
Raid A.I; Omar A.A
Abstract
In2O3 thin films have been deposited on silicon substrate by chemical spray pyrolysis. These films show high transparency in the visible and near-IR regions. Photoresponse of In2O3/c-Si isotype hetero-photodiode without post-deposition heat treatment has been investigated in the visible and infrared regions. Peak response situated at 600nm was observed. External quantum efficiency was 32% at peak response. C-V measurements revealed that the junction was abrupt type and built-in potential around 1eV has been obtained.
Keywords
Thin films; Spray Pyrolysis; Optical response; Heterojunction
Statistics
Article View: 70
PDF Download: 17


Journal Management System. Powered by iJournalPro.com