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Study the Optical Properties of TiO2 Thin Films Prepared by Rapid Thermal Oxidation S | ||
| Al-Mustansiriyah Journal of Science | ||
| Article 1, Volume 24, Issue 4, 2013, Pages 75-84 | ||
| Author | ||
| Saad N. Ibrahim | ||
| Abstract | ||
| TiO2 thin films were deposited by thermal oxidation method on glass substrate at room temperature. The oxidation of Titanium Ti was accomplished at different temperature (400℃, 500℃) in time (30 sec). The x-ray diffraction patterns show the amorphous structure of TiO2 thin films. The optical constants were characterized using the transmission spectra of the films obtained by uv-vis spectrophotometer. The optical band gaps were evaluated through Tauce model. It was observed that TiO2 films exhibited high visible transmittance and transmittance decreased slightly with the increase of oxidation temperature. The refractive index of the films was found from (1.96-1.98) at 550 nm in the visible range. The extinction coefficient was found to increasing with increasing oxidation temperature. The allowed indirect optical band gab of the films was estimated to be in range from (2.9-3 eV) which shows a small variation. The forbidden direct band gap was found to increase from (2.8-2.9 eV). | ||
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