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Effect of Argon Gas on the Structure and Optical Properties of Nano Titanium Oxide Prepared by PLD | ||
| Iraqi Journal of Science | ||
| Article 1, Volume 54, Issue 5, 2013, Pages 1102-1107 | ||
| Author | ||
| Farah A. Hattab | ||
| Abstract | ||
| In this research the effect of laser energy by using argon gas on the some physical properties of semiconductor film of TiO2, was studied used Q-Switch Nd:YAG laser in different energies (600-1000) mJ with temperature 100 0C for glass substrate under vacuum nearly 10-3 mbar. From X-ray diffraction we found the film characterized as crystal with plane (110) at 2-θ equal to 27.3̊, and by AFM test the roughness of films increased when the energy of laser increased too. The values of roughness between (6.77-13) nm, therefore the thicknesses increased to change from (34.88 - 165.48) nm, so the absorption of film increased because of the thickness of the film increased and we can get the optical energy gap between (3.6-3.9) eV. | ||
| Keywords | ||
| Titanium di; oxide; Thin films; laser deposition | ||
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