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Oxygen Pressure Effect on Optical Properties and FTIR Results of MgO Thin Films Prepared Using RPLD Technique | ||
| Al-Mustansiriyah Journal of Science | ||
| Article 1, Volume 21, Issue 5, 2010, Pages 1-13 | ||
| Author | ||
| Evan T. Salem | ||
| Abstract | ||
| In the present work, oxygen pressure effect on optical and FTIR spectrum of MgO dielectric oxide thin film has been carried out using Reactive Pulsed Laser as a Deposition technique (RPLD),werer (7nsec) Nd-YAG laser has been use to ablated pure Mg target and deposited on glass substrates. This has been done at different oxygen back ground pressure ranged from (150-300) mbar and constant substrate temperature of (423K).The result shows that the bond formation between Mg and oxygen atoms is directly depended on the back ground oxygen pressure. The optical properties of MgO films show that high transparency of about (80-85) % can be achieved with MgO film which it self decreases sharply with the decreasing of oxygen pressure. While the optical ban gap is 5.01eV at optimum oxygen pressure of (200) mbar. | ||
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